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| Academic Year | 2008 |
|---|---|
| Journal Ranking | SCI |
| Title of paper | Modeling and characteristic analysis of silicon-on-insulator lateral-double-diffusion metal oxide semiconductor |
| Journal | Japanese Journal of Applied Physics |
| Date of Publication | 2008-11-14 |
| Volume | 47 |
| Issue | 11 |
| 起迄頁 | 8243 |
| 起迄頁 | 8247 |
| 總頁數 | 5 |
| Chinese name | Jyh-Ling Lin |
| English name | Jyh-Ling Lin |
| Authors | Jyh-Ling LIN, Chen-I LIN, Li-Jheng LIN |
| Number of authors | 3 |
| 作者型態 | First Author |
| ISSN(ISBN) | 1347-4065 |
| Language | 英文 |
